Specific Process Knowledge/Lithography/LiftOff: Difference between revisions
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*'''4'''. The masking material is dissolved, thus lifting part of the deposited material. | *'''4'''. The masking material is dissolved, thus lifting part of the deposited material. | ||
*'''5'''. The remaining material forms the desired pattern on the substrate. | *'''5'''. The remaining material forms the desired pattern on the substrate. | ||
{| border="2" cellspacing="0" cellpadding="2" | {| border="2" cellspacing="0" cellpadding="2" | ||