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Specific Process Knowledge/Etch/Wet Silicon Oxide Etch (BHF): Difference between revisions

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<gallery caption="Different places to do wet silicon oxide etch" widths="220px" heights="225px" perrow="5"> image:BHF clean D-3.jpg|BHF clean in D-3. Wet silicon oxide etch bath positioned to the right in the wetbench. This bath can also be used for BHF with wetting agent.  
<gallery caption="Different places to do wet silicon oxide etch" widths="220px" heights="225px" perrow="5"> image:BHF clean D-3.jpg|BHF clean in D-3. Wet silicon oxide etch bath positioned to the right in the wetbench. This bath can also be used for BHF with wetting agent.  
image:KOH3 RR4 1.JPG|BHF in cleanroom D-3 (KOH bench 6".) The BHF bath is positioned to the right. This is primarily used to remove oxide before and after a KOH etch.
image:KOH3 RR4 1.JPG|BHF in cleanroom D-3 (KOH bench 6".) The BHF bath is positioned in the middle of the bath. This is primarily used to remove oxide before and after a Si etch etch.
image:BHF-PolySi-Al Etch.jpg|SIO etch bath (BHF with wetting agent) are positioned to the left in the bench in cleanroom D-3.  
image:BHF-PolySi-Al Etch.jpg|RAA BHF etch in RCA bench in B-1.  
image:Stinkskab RR2.jpg|PP-bath: positioned in the upper right corner of the fumehood in cleanroom B-1. </gallery>
image:Stinkskab RR2.jpg|PP-bath: positioned in the upper right corner of the fumehood in cleanroom B-1. </gallery>


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