Specific Process Knowledge/Etch/Wet Silicon Nitride Etch: Difference between revisions

Revision as of 09:37, 22 February 2017 view source Mbec (talk \| contribs) DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers 186 edits →Wet Silicon Nitride Etch ← Older edit		Revision as of 09:38, 22 February 2017 view source Mbec (talk \| contribs) DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers 186 edits →Wet Silicon Nitride Etch Newer edit →
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	'''NB: Great care has to be taken in this process due to risk of "shock-boiling" Therefore it is essential, that you stir thorough during heat up, before you start heating, at 50°C and ~~last time~~ at 100°C'''		'''NB: Great care has to be taken in this process due to risk of "shock-boiling" Therefore it is essential, that you stir thorough during heat up, before you start heating, at 50°C and finally at 100°C'''