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Specific Process Knowledge/Thin film deposition/Furnace LPCVD Nitride: Difference between revisions

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DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers
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Paphol (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers
912 edits
Line 76: Line 76:
|style="background:LightGrey; color:black"|Temperature
|style="background:LightGrey; color:black"|Temperature
|style="background:WhiteSmoke; color:black"|
|style="background:WhiteSmoke; color:black"|
*830-845 <sup>o</sup>C
*810-845 <sup>o</sup>C
The temperature vary over the furnace tube
The temperature vary over the furnace tube
|style="background:WhiteSmoke; color:black"|
|style="background:WhiteSmoke; color:black"|
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