Specific Process Knowledge/Thin film deposition/ALD2 (PEALD): Difference between revisions
| Line 52: | Line 52: | ||
*[http://labadviser.danchip.dtu.dk/index.php/Specific_Process_Knowledge/Thin_film_deposition/ALD_Picosun_R200/Al2O3_deposition_using_ALD2 Al<sub>2</sub>O<sub>3</sub> deposition using '''ALD2'''] | *[http://labadviser.danchip.dtu.dk/index.php/Specific_Process_Knowledge/Thin_film_deposition/ALD_Picosun_R200/Al2O3_deposition_using_ALD2 Al<sub>2</sub>O<sub>3</sub> deposition using '''ALD2'''] | ||
*[http://labadviser.danchip.dtu.dk/index.php/Specific_Process_Knowledge/Thin_film_deposition/ALD_Picosun_R200/TiO2_deposition_using_ALD2 TiO<sub>2</sub> deposition using '''ALD2'''] | *[http://labadviser.danchip.dtu.dk/index.php/Specific_Process_Knowledge/Thin_film_deposition/ALD_Picosun_R200/TiO2_deposition_using_ALD2 TiO<sub>2</sub> deposition using '''ALD2'''] | ||
*[http://labadviser.danchip.dtu.dk/index.php/Specific_Process_Knowledge/Thin_film_deposition/ALD_Picosun_R200/ | *[http://labadviser.danchip.dtu.dk/index.php/Specific_Process_Knowledge/Thin_film_deposition/ALD_Picosun_R200/HfO2_deposition_using_ALD2 HfO<sub>2</sub> deposition using '''ALD2'''] | ||
*[http://labadviser.danchip.dtu.dk/index.php/Specific_Process_Knowledge/Thin_film_deposition/ALD_Picosun_R200/TiO2_deposition_using_ALD2 SiO<sub>2</sub> deposition using '''ALD2'''] | *[http://labadviser.danchip.dtu.dk/index.php/Specific_Process_Knowledge/Thin_film_deposition/ALD_Picosun_R200/TiO2_deposition_using_ALD2 SiO<sub>2</sub> deposition using '''ALD2'''] | ||
*[http://labadviser.danchip.dtu.dk/index.php/Specific_Process_Knowledge/Thin_film_deposition/ALD_Picosun_R200/TiO2_deposition_using_ALD2 AlN deposition using '''ALD2'''] | *[http://labadviser.danchip.dtu.dk/index.php/Specific_Process_Knowledge/Thin_film_deposition/ALD_Picosun_R200/TiO2_deposition_using_ALD2 AlN deposition using '''ALD2'''] | ||