Specific Process Knowledge/Lithography/Pretreatment: Difference between revisions
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The molecular formula for hexamethyldisilazane, or bis(trimethylsilyl)amine, is C<sub>6</sub>H<sub>19</sub>NSi<sub>2</sub>. Here is a schematic overview of HMDS treatment of silicon-oxide surface. | The molecular formula for hexamethyldisilazane, or bis(trimethylsilyl)amine, is C<sub>6</sub>H<sub>19</sub>NSi<sub>2</sub>. Here is a schematic overview of HMDS treatment of silicon-oxide surface. | ||
[[Image:HMDS.jpg|500x500px|thumb|left|Priming of oxide-forming substrates by HMDS treatment.]] | [[Image:HMDS new.jpg|500x500px|thumb|left|Priming of oxide-forming substrates by HMDS treatment.]] | ||
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