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Specific Process Knowledge/Thin film deposition/Furnace LPCVD TEOS: Difference between revisions

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!style="background:silver; color:black;" align="left"|Purpose  
!style="background:silver; color:black;" align="left"|Purpose  
|style="background:LightGrey; color:black"|Deposition of TEOS silicon oxide ||style="background:WhiteSmoke; color:black"|.
|style="background:LightGrey; color:black"|Deposition of TEOS silicon oxide ||style="background:WhiteSmoke; color:black"|
 
*Deposition of silicon oxide on silicon nitride
*Deposition of silicon oxide on structured surfaces, eg. to cover holes or sealing small cavities.  
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!style="background:silver; color:black" align="left"|Performance
!style="background:silver; color:black" align="left"|Performance
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