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Specific Process Knowledge/Etch/DRIE-Pegasus: Difference between revisions

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Jmli (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers
4,569 edits
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*[[Specific Process Knowledge/Etch/DRIE-Pegasus/nanoetch|Nanoetch]]
*[[Specific Process Knowledge/Etch/DRIE-Pegasus/nanoetch|Nanoetch]]
*[[Specific Process Knowledge/Etch/DRIE-Pegasus/DUVetches|Etch processes with DUV masks]]
*[[Specific Process Knowledge/Etch/DRIE-Pegasus/Barc|BARC etches]]
*[[Specific Process Knowledge/Etch/DRIE-Pegasus/Isotropic|Isotropic etches]]


More processes, such as for DUV resist, are currently being developed, but they are not quite 'ready for publication' at LabAdviser so please contact Jonas (mailto:jml@danchip.dtu.dk) for more information.
More processes, such as for DUV resist, are currently being developed, but they are not quite 'ready for publication' at LabAdviser so please contact Jonas (mailto:jml@danchip.dtu.dk) for more information.
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