Specific Process Knowledge/Pattern Design

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Pattern Design and Mask Fabrication

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Pattern Design

For making a pattern on a substrate it is necescary to use a software tool to design the pattern layout. This counts for all kind of lithography and laser cutting. There are a number of differernt software tools that can be used, some of the more commonly used are:

• CleWin
• L-Edit
• Autocad

At Danchip we offer all users free access to CleWin 5 for their mask layout. We have at least 50 floating licenses for concurrent usage.

There are two ways to use the software:

• Without installation. You log on to a terminal server where the software is already installed and you use it right away. Click here for guidelines.
• With installation of the CleWin 5 software on your local computer and obtaining a license from the DTU license server. Click here for guidelines.

Find the official CleWin 5 User Guide here. The last document can also be found in the CleWin 5 installation directory (C:\Program Files (x86)\CleWin5) if you have made a local installation.

If you have a Mac or Linux computer look here.

Layout file format

• For E-beam lithography the layout file has to prepared as a GDS file and a v30 file. For details about how to prepare a GDS file and a v30 file for e-beam, please see Preparing a GDS file. For details about how to make alligned E-beam patterns, please have at look at Design of global marks and chip marks

• For laser cutting the layout file has to be saved as a DXF file that is uploaded to the equipment computer. For more details concerning pattern design for the laser see Mask Making on the Laser Micro Machining Tool.

• For UV-lithography it is necescary to have a physical masks produced based on the layout file. The file format has to be CIF or GDS. For more details se below Mask Fabrication for UV-lithography.

• For DUV-lithography and DUV-lithography it is necescary to have physical masks (reticles) produced based on the layout file. The file format has to be GDS. For more details concerning the design of reticle see Design of Reticles.

Mask drawing with Matlab and AutoCAD

To come soon

Mask Fabrication for UV-lithography

Tips and tricks for mask designing

You can find a

• "Beginners guide to mask design" here and
• Guide to mask making.pdf. Unfortunately this is quite old, but may be useful anyway. Note some links/e-mails etc. are not correct anymore

Alignment marks

The following alignment marks are suggested to use on the EVG620 automatic aligner for good pattern recognition. Pleased be adviced that they can be removed in KOH etching.

• Alignment marks 2 .cif - You need the program "Clewin" to open this file
• Alignment marks 2 .tdb - You need the program "L-Edit" to open this file

Alignment marks location

For the KS Aligner, MA6-2 and Aligner-6inch

• The mask's alignment marks for 4inch process:
  • For Back Side Alignment (BSA) alignment marks must be located between -1,0 and +1,0 mm in vertical location from mask center (y=0-+1mm) and exactly at 45mm in left and right in horizontal location (x=+-45mm).
  • For Top Side Alignment (TSA) alignment marks must be located 35-45 mm in left and right in horizontal location and between -2 and +2 mm in vertical location.

• The mask's alignment marks for 6inch process:
  • Both BSA and TSA must be located between -2,5 and +2,5 mm in vertical location from mask center and 60 mm in left and right in horizontal location.
  • Please notice that if you plan to use the automatic alignment option the alignment marks must be displaced from y=0 to y=+/- 1,6mm.

How to order a mask

Our standard mask supplier is Delta Mask. The smallest feature size obtainable from Delta Mask is 1.5 µm. If you need structures smaller than this please write it specificly in the e-mail. Be aware that this will increase the price by at least a factor of 3.

Send your CIF file or GDS file (for 7" mask or masks with CD less than 1.5µm only GDS formats should be used) in an e-mail along with a text file describing your specs (example spec file).

If you are using L-edit to design your mask you should remember to mark the top cell as the fabrication cell (a small pink f should show to the left of the cell name in the Design Navigator.

Remember to make only the layers for fabrication visible. The remaining should be invisible. Give each layer appropriate GDS number respectively CIF names before exporting the file. This is done by double click on the layers and fill out the window that pops up.

E-mail address can be found in Danchip_contact_information.

Cost is available upon request. Write to danchipsupport@danchip.dtu.dk

Mask sets made by Danchip

Danchip quality control masks

This section contains a description of some of the quality control designs.

ASE standisation designs: The quality control procedure on the ASE is using the daqmask 2 mask

• File:Daqmask2.pdf
• File:Daqmask2-a.tdb

RIE standisation design: The quality control procedures on RIE2 is using the dASEfeRIE mask

• File:Daseferie.pdf
• File:DASEfeRIE.tdb

Masks for process development

• Travka mask set (7 masks)