Specific Process Knowledge/Pattern Design: Difference between revisions
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If you have a Mac or Linux computer look [[/CleWin#Working with a Mac or Linux computer |here]]. | If you have a Mac or Linux computer look [[/CleWin#Working with a Mac or Linux computer |here]]. | ||
For E-beam lithography | |||
For E-beam lithography the layout file has to be saved as a DXF | |||
For laser cutting the layout file has to be saved as a DXF file that is uploaded to the tools computer. For more details see [[Specific_Process_Knowledge/Back-end_processing/Mask_making|Mask Making on the Laser Micro Machining Tool]]. | |||
For UV-lithography and DUV-lithography it is necescary to have a physical masks produced based on the layout file. | |||