Specific Process Knowledge/Thermal Process/Dope with Phosphorus: Difference between revisions
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{| border="1" cellspacing="1" cellpadding="2" style="text-align:center;" width="690" ||3||4||5 | {| border="1" cellspacing="1" cellpadding="2" style="text-align:center;" width="690" ||3||4||5 | ||
!| Run #||Temperature||Process time with POCl<sub>3</sub>||Annealing time in | !| Run #||Temperature||Process time with POCl<sub>3</sub>||Annealing time in O<sub>2</sub>||Wafer # | ||
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|1||850 <sup>o</sup>C||15 minutes||20 miuntes||1, 2, 3, 4 | |1||850 <sup>o</sup>C||15 minutes||20 miuntes||1, 2, 3, 4 | ||