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Specific Process Knowledge/Thermal Process/Dope with Phosphorus: Difference between revisions

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Kabi (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers
1,142 edits
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====1. Process parameters====
====1. Process parameters====
'''Substrate:''' p-type Si(100) 1-20 Ωcm resistivity
'''Substrate:''' p-type Si(100,)  
 
'''Resistivity:''' 1-20 Ωcm  


'''Recipe:'''  POCL900
'''Recipe:'''  POCL900
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