Specific Process Knowledge/Thin film deposition/Lesker: Difference between revisions

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 ====Thickness uniformity====
-We have measured the thickness of a TiO_x film deposited on a 6" si wafer.
+We have measured the thickness of a TiO<sub>x</sub> film deposited on a 6" si wafer.
 Deposition parameters were:
-Recipe	time	gas	pressure	Gun A	Target A	Target A	power A	Voltage A	Power
-source 3 with oxygen 	600	10% O2 in Ar	3	3	Ti	200	370
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 !style="background:silver; color:black;" align="left"|Gas
-|style="background:WhiteSmoke; color:black"|O{sub}2/Ar Ratio 100/10
+|style="background:WhiteSmoke; color:black"|O<sub>2</sub>/Ar Ratio 100/10
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 !style="background:silver; color:black;" align="left"|Pressure