Specific Process Knowledge/Lithography/PMMA: Difference between revisions

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|-style="background:Black; color:White"
|-style="background:silver; color:black"
|'''Resist'''
|'''Resist'''
|'''Polarity'''
|'''Polarity'''
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|'''Technical reports'''
|'''Technical reports'''
|'''Spinner'''
|'''Spinner'''
|'''Thinner'''
|'''Developer'''
|'''Developer'''
|'''Rinse'''
|'''Rinse'''
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|-style="background:WhiteSmoke; color:black"
|'''[[Specific_Process_Knowledge/Lithography/CSAR|CSAR]]'''
|'''[[Specific_Process_Knowledge/Lithography/PMMA|PMMA]]'''
|Positive
|Positive
|[http://www.allresist.com AllResist]
| [http://www.allresist.com AllResist]
|Standard positive resist, very similar to ZEP520.
|We have various types of PMMA in the cleanroom. Please contact [mailto:Lithography@danchip.dtu.dk Lithography] for information.
|[[media:Allresist_CSAR62_English.pdf‎|Allresist_CSAR62_English.pdf‎]],, [[media:CSAR_62_Abstract_Allresist.pdf‎|CSAR_62_Abstract_Allresist.pdf‎]]
|
|[[Specific_Process_Knowledge/Lithography/Coaters#Manual Spinner 1|Manual Spinner 1 (Laurell)]], [[Specific_Process_Knowledge/Lithography/Coaters#Spin_coater:_Manual_Labspin|Spin Coater Labspin]]
|See table <u>[[Specific_Process_Knowledge/Lithography/Coaters#Coaters:_Comparison_Table|here]] </u>
|XAR-600-546, XAR-600-548, N50, MIBK:IPA
|Anisole
|MIBK:IPA (1:3), IPA:H2O
|IPA
|IPA
|AR-600-71, 1165 Remover
|acetone/1165
|[[media:Process_Flow_CSAR.docx‎|Process Flow CSAR.docx‎]]
|
|}




Revision as of 14:27, 30 October 2015

Resist Polarity Manufacturer Comments Technical reports Spinner Thinner Developer Rinse Remover Process flows (in docx-format)
PMMA Positive AllResist We have various types of PMMA in the cleanroom. Please contact Lithography for information. See table here Anisole MIBK:IPA (1:3), IPA:H2O IPA acetone/1165


Spin Curves

The thickness is measured on VASE Ellipsometer using a simple Cauchy model for a transparent polymer on Si. The measurements are performed at one incidence angle (70 degrees) only. 9 points on each 4" wafer has been measured; the standard deviation thus representing the homogeinity of the film on the 4" wafers.



AllResist AR-P 672.03 (PMMA) (~ 2ml per 4" wafer) spin coated on 'Spin Coater: Manual Standard Resists, E-5, WILTID & TIGRE, 26-10-2015. Softbake 3 min @ 150 degC.
Spin Speed [rpm] Acceleration [1/s2] Thickness [nm] St Dev
4000 2000 95.55 0.55
5000 2000 85.50 0.92
7000 2000 72.79 1.18


AllResist AR-P 672.03 (PMMA) diluted 1:1 in Anisole (~ 2ml per 4" wafer) spin coated on 'Spin Coater: Manual Standard Resists, E-5, WILTID & TIGRE, 26-10-2015. Softbake 3 min @ 150 degC.
Spin Speed [rpm] Acceleration [1/s2] Thickness [nm] St Dev
2000 2000 51.37 0.25
3000 2000 41.97 0.24
4000 2000 36.25 0.25
5000 2000 32.42 0.30
6000 2000 30.17 0.29
7000 2000 28.76 0.43
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