Specific Process Knowledge/Lithography/PMMA: Difference between revisions

Revision as of 14:23, 30 October 2015

Resist	Polarity	Manufacturer	Comments	Technical reports	Spinner	Developer	Rinse	Remover	Process flows (in docx-format)
CSAR	Positive	AllResist	Standard positive resist, very similar to ZEP520.	Allresist_CSAR62_English.pdf‎,, CSAR_62_Abstract_Allresist.pdf‎	Manual Spinner 1 (Laurell), Spin Coater Labspin	XAR-600-546, XAR-600-548, N50, MIBK:IPA	IPA	AR-600-71, 1165 Remover	Process Flow CSAR.docx‎

Spin Curves

The thickness is measured on VASE Ellipsometer using a simple Cauchy model for a transparent polymer on Si. The measurements are performed at one incidence angle (70 degrees) only. 9 points on each 4" wafer has been measured; the standard deviation thus representing the homogeinity of the film on the 4" wafers.

File:SpinCurvePMMA.jpg

AllResist AR-P 672.03 (PMMA) (~ 2ml per 4" wafer) spin coated on 'Spin Coater: Manual Standard Resists, E-5, WILTID & TIGRE, 26-10-2015. Softbake 3 min @ 150 degC.
Spin Speed [rpm]	Acceleration [1/s2]	Thickness [nm]	St Dev
4000	2000	95.55	0.55
5000	2000	85.50	0.92
7000	2000	72.79	1.18

AllResist AR-P 672.03 (PMMA) diluted 1:1 in Anisole (~ 2ml per 4" wafer) spin coated on 'Spin Coater: Manual Standard Resists, E-5, WILTID & TIGRE, 26-10-2015. Softbake 3 min @ 150 degC.
Spin Speed [rpm]	Acceleration [1/s2]	Thickness [nm]	St Dev
2000	2000	51.37	0.25
3000	2000	41.97	0.24
4000	2000	36.25	0.25

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 !colspan="7"|AllResist AR-P 672.03 (PMMA) diluted 1:1 in Anisole (~ 2ml per 4" wafer) spin coated on 'Spin Coater: Manual Standard Resists, E-5, WILTID & TIGRE, 26-10-2015. Softbake 3 min @ 150 degC.
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