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Specific Process Knowledge/Thin film deposition/Deposition of Silicon Oxide/Deposition of Silicon Oxide using PECVD: Difference between revisions

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===Deposition rate as a function of deposition time using 1STOxide:===
===Deposition rate as a function of deposition time using 1Ox_old:===
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===Thickness uniformity of test wafer using the test recipe===
===Thickness uniformity of test wafer using the test recipe===
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