Specific Process Knowledge/Lithography/UVExposure: Difference between revisions

@@ Line 175: / Line 175: @@
 |style="background:LightGrey; color:black"|
 |style="background:WhiteSmoke; color:black" align="center" colspan="2"|
-Alignment and UV exposure
+Alignment and UV exposure, potentially DUV exposure
 |-
@@ Line 188: / Line 188: @@
 *broadband (i-, g-, h-line)
 *365 nm (i-line)
-*DUV (240 nm)
+*DUV (240 nm) <sup>1)</sup>
 |-
 |style="background:LightGrey; color:black"|Minimum structure size
 |style="background:WhiteSmoke; color:black" align="center" colspan="2"|
-down to 0.5µm
+down to 0.5µm <sup>1)</sup>
 |-
 |style="background:LightGrey; color:black"|Mask size
@@ Line 221: / Line 221: @@
 |-
 |}
+<sup>1)</sup> Not available yet.
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