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This section is under construction [[Image:section under construction.jpg|70px]]
This section is under construction [[Image:section under construction.jpg|70px]]


Aligner: MA6 - 2 will be released for use Q2 2015.
Aligner: MA6 - 2 will be released for use Q3 2015.


[[Image:AlignerMA6-2 in E-4.jpg|300x300px|thumb|The Aligner: MA6 - 2 is placed in E-4]]
[[Image:AlignerMA6-2 in E-4.jpg|300x300px|thumb|The Aligner: MA6 - 2 is placed in E-4]]
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The Süss MicroTek Mask Aligner MA6 is designed for high resolution photolithography.  
The Süss MicroTek Mask Aligner MA6 is designed for high resolution photolithography.  
The 365nm exposure wavelength version is capable of 1.25 (1.0) um resolution in vacuum contact. All contact exposure programs (vacuum, hard, soft, proximity) are supplied.  
The 365nm exposure wavelength version is capable of 1.25 (1.0) um resolution in vacuum contact. All contact exposure programs (vacuum, low vacuum, hard, soft, proximity) are supplied.  
Two alignment options are available: top side alignment (TSA) with a split field or a video microscope and back side alignment (BSA) with BSA microscope. It is also possible to make IR- light alignment.
Two alignment options are available: top side alignment (TSA) with a split field or a video microscope and back side alignment (BSA) with BSA (video) microscope.


'''The user manual, APV, and contact information can be found in [http://labmanager.danchip.dtu.dk/function.php?module=Machine&view=view&mach=339 LabManager].'''
'''The user manual, APV, and contact information can be found in [http://labmanager.danchip.dtu.dk/function.php?module=Machine&view=view&mach=339 LabManager].'''


===Process information===
===Process information===
The KS Aligner has an i-line notch filter installed. This results in an exposure light peak around 365nm with a FWHM of 7nm. Dependent on the spectral sensitivity of the resist, the optimal dose may be increased compared to broadband exposure on the Aligner-6inch.
The Aligner: MA6 - 2 has an i-line notch filter installed. This results in an exposure light peak at 365nm. Compared to exposure on the KS Aligner, the optimal dose should be very similar. Dependent on the spectral sensitivity of the resist, the optimal dose may be increased compared to broadband exposure on the Aligner-6inch.
 
The 500W


*[[Specific Process Knowledge/Lithography/UVExposure_Dose|Information on UV exposure dose]]
*[[Specific Process Knowledge/Lithography/UVExposure_Dose|Information on UV exposure dose]]
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