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| ''Recipe names, process parameters, and test results:'' | | ''Recipe names, process parameters, and test results:'' |
| *'''1 DCH 5214E man disp 1.5um'''
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| Spin-off: 30 s at 4700 rpm. '''OBS!''' ''Do not use with non-vacuum chuck!''
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|
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| {|border="1" cellspacing="0" cellpadding="3" style="text-align:left;"
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| |-
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| |-style="background:silver; color:black"
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| !Substrate
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| !Thickness
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| !Uniformity (+/-)
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| !Test date
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| !Tester initials
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| !Comments
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| |-
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| |-style="background:WhiteSmoke; color:black"
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| |Silicon with native oxide
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| |1.52 µm
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| |0.3%
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| |21/4 2015
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| |taran
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| |9 points on one wafer, exclusion zone 5mm
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| |}
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| *'''1 DCH 5214E man disp 2.2um''' | | *'''1 DCH 5214E man disp 2.2um''' |
