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Specific Process Knowledge/Lithography/Coaters/Spin Coater: RCD8 processing: Difference between revisions

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Taran (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab307-labadviser-users-34891
3,794 edits
Line 247: Line 247:


==Automatic dispense==
==Automatic dispense==
*1 TMPLT aut disp SU8
*'''1 TMPLT aut disp SU8'''
*1 TMPLT aut disp SU8 Gyrset
Dispense; SU-8 string breaking; spread step; acceleration to spin-off; deceleration.
*1 TMPLT aut disp
*'''1 TMPLT aut disp SU8 Gyrset'''
*1 TMPLT aut disp spread
Dispense; SU-8 string breaking; Gyrset down; spread step; acceleration to spin-off; deceleration; Gyrset up.
*1 TMPLT aut disp Gyrset
*'''1 TMPLT aut disp'''
*1 TMPLT aut disp Gyrset sprd
Dispense; acceleration to spin-off; deceleration.
*'''1 TMPLT aut disp spread'''
Dispense; spread step; acceleration to spin-off; deceleration.
*'''1 TMPLT aut disp Gyrset'''
Dispense; Gyrset down; acceleration to spin-off; deceleration; Gyrset up.
*'''1 TMPLT aut disp Gyrset sprd'''
Dispense; Gyrset down; spread step; acceleration to spin-off; deceleration; Gyrset up.
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