Specific Process Knowledge/Lithography/Coaters/Spin Coater: RCD8 processing: Difference between revisions
| Line 237: | Line 237: | ||
=Template recipes= | =Template recipes= | ||
==Manual dispense== | ==Manual dispense== | ||
*1 TMPLT man disp | *'''1 TMPLT man disp''' | ||
Acceleration to spin-off; deceleration. | Acceleration to spin-off; deceleration. | ||
*1 TMPLT man disp spread | *'''1 TMPLT man disp spread''' | ||
Spread step; acceleration to spin-off; deceleration. | Spread step; acceleration to spin-off; deceleration. | ||
*1 TMPLT man disp Gyrset | *'''1 TMPLT man disp Gyrset''' | ||
Gyrset down; acceleration to spin-off; deceleration; Gyrset up. | Gyrset down; acceleration to spin-off; deceleration; Gyrset up. | ||
*1 TMPLT man disp Gyrset sprd | *'''1 TMPLT man disp Gyrset sprd''' | ||
Gyrset down; spread step; acceleration to spin-off; deceleration; Gyrset up. | Gyrset down; spread step; acceleration to spin-off; deceleration; Gyrset up. | ||