Specific Process Knowledge/Lithography/Coaters/Spin Coater: RCD8 processing: Difference between revisions
| Line 176: | Line 176: | ||
==AZ MiR 701== | ==AZ MiR 701== | ||
[[Image:RCD8 AZ | [[Image:RCD8 AZ MiR 701.jpg|300x300px|thumb|right|Spin curve for AZ MiR 701 (29cps)]] | ||
Spin coating of AZ MiR 701 (29cps) on Spin Coater: RCD8 using manual dispense is a very simple process. The wafer is accelerated at 1000rpm/s to the spin-off speed, spun for 30s, then decelerated at 1000rpm/s. | Spin coating of AZ MiR 701 (29cps) on Spin Coater: RCD8 using manual dispense is a very simple process. The wafer is accelerated at 1000rpm/s to the spin-off speed, spun for 30s, then decelerated at 1000rpm/s. | ||