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Specific Process Knowledge/Lithography/Coaters/Spin Coater: RCD8 processing: Difference between revisions

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DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab307-labadviser-users-34891
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==AZ 4562==
==AZ 4562==
[[Image:RCD8 AZ 4562.jpg|300x300px|thumb|right|Spin curve for AZ 4562]]
[[Image:RCD8 AZ 4562.jpg|300x300px|thumb|right|Spin curve for AZ 4562]]
Spin coating of AZ 5214E on Spin Coater: RCD8 using manual dispense is a very simple process. The wafer is accelerated at 1000rpm/s to the spin-off speed, spun for 30s, then decelerated at 1000rpm/s.
Spin coating of AZ 4562 on Spin Coater: RCD8 using manual dispense is a very simple process. The wafer is accelerated at 1000rpm/s to the spin-off speed, spun for 30s, then decelerated at 1000rpm/s.


''Recipe names, process parameters, and test results:''
''Recipe names, process parameters, and test results:''
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