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Specific Process Knowledge/Lithography/Coaters/Spin Coater: RCD8 processing: Difference between revisions

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Taran (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab307-labadviser-users-34891
3,526 edits
Taran (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab307-labadviser-users-34891
3,526 edits
Line 94: Line 94:
''Flow names, process parameters, and test results:''
''Flow names, process parameters, and test results:''
*'''1 DCH 5214E man disp 1.5um'''
*'''1 DCH 5214E man disp 1.5um'''
Spin-off: 30 s at 4700 rpm. OBS! Do not us with non-vacuum chuck!
Spin-off: 30 s at 4700 rpm. '''OBS!''' ''Do not use with non-vacuum chuck!''


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