Specific Process Knowledge/Lithography/Coaters/Spin Coater: RCD8 processing: Difference between revisions
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==SU-8== | ==SU-8== | ||
*1 DCH SU8 aut disp 100um | Spin coating of SU-8 2075 on Spin Coater: RCD8 is... | ||
*1 DCH SU8 aut dsp Grst 100um | |||
''Flow names, process parameters, and test results:'' | |||
*'''1 DCH SU8 aut disp 100um''' | |||
Spin-off: 30 s at 2100 rpm. | |||
{|border="1" cellspacing="0" cellpadding="3" style="text-align:left;" | |||
|- | |||
|-style="background:silver; color:black" | |||
!Substrate | |||
!Thickness | |||
!Uniformity (+/-) | |||
!Test date | |||
!Tester initials | |||
!Comments | |||
|- | |||
|-style="background:WhiteSmoke; color:black" | |||
|Silicon with native oxide | |||
|100 µm | |||
|3.5% | |||
|14/4 2015 | |||
|taran | |||
|5 points on one wafer, exclusion zone 15mm | |||
|} | |||
*'''1 DCH SU8 aut dsp Grst 100um''' | |||
Spin-off: 30 s at 2000 rpm. | |||
{|border="1" cellspacing="0" cellpadding="3" style="text-align:left;" | |||
|- | |||
|-style="background:silver; color:black" | |||
!Substrate | |||
!Thickness | |||
!Uniformity (+/-) | |||
!Test date | |||
!Tester initials | |||
!Comments | |||
|- | |||
|-style="background:WhiteSmoke; color:black" | |||
|Silicon with native oxide | |||
|99 µm | |||
|3.0% | |||
|15/4 2013 | |||
|taran | |||
|5 points on one wafer, exclusion zone 15mm | |||
|} | |||
==AZ 5214E== | ==AZ 5214E== | ||