Specific Process Knowledge/Lithography/UVExposure: Difference between revisions
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'''Feedback to this section''': '''[mailto:labadviser@danchip.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.danchip.dtu.dk/index.php/Specific_Process_Knowledge/Lithography/UVExposure#III-V_Aligner click here]''' | '''Feedback to this section''': '''[mailto:labadviser@danchip.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.danchip.dtu.dk/index.php/Specific_Process_Knowledge/Lithography/UVExposure#III-V_Aligner click here]''' | ||
The | The K&W MA1006 mask aligner located in the III-V cleanroom is dedicated for processing of III-V compound semiconductors. | ||
Specific use of the mask aligner can be found in the standard resist recipes. | Specific use of the mask aligner can be found in the standard resist recipes. | ||