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Specific Process Knowledge/Lithography/Coaters: Difference between revisions

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Line 238: Line 238:
|-style="background:WhiteSmoke; color:black"
|-style="background:WhiteSmoke; color:black"
|Silicon with native oxide
|Silicon with native oxide
|1,405
|1,446
|2,7%
|5,5%
|29/1 2015
|17/02 2015
|chasil
|chasil
|with HMDS. Average of 5 wafers
|with HMDS. Average of 3 wafers


|-
|-
|-style="background:WhiteSmoke; color:black"
|-style="background:WhiteSmoke; color:black"
|Silicon with native oxide
|Silicon with native oxide
|1,446
|1,415
|5,5%
|3,7%
|17/02 2015
|1/4 2015
|chasil
|chasil
|with HMDS. Average of 3 wafers
|with HMDS. Average of 3 wafers
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