Specific Process Knowledge/Lithography/Coaters: Difference between revisions
Appearance
| Line 243: | Line 243: | ||
|with HMDS. Average of 5 wafers | |with HMDS. Average of 5 wafers | ||
|- | |||
|-style="background:WhiteSmoke; color:black" | |||
|Silicon with native oxide | |||
|1,405 | |||
|2,7% | |||
|29/1 2015 | |||
|chasil | |||
|with HMDS. Average of 5 wafers | |||
|} | |} | ||