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Specific Process Knowledge/Etch/DRIE-Pegasus/showerheadchange: Difference between revisions

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Jmli (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers
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== Process B ==
== Process D ==




Line 181: Line 181:
! width="100" | Key words
! width="100" | Key words
|-
|-
! rowspan="4" | Process A   <!-- recipe name -->
! rowspan="4" | Process D   <!-- recipe name -->
! Step1 11 cyc <!-- step -->
! Original <!-- step -->
| rowspan="2" |20       <!-- chiller temp -->
| 0       <!-- chiller temp -->
! 4       <!-- dep time -->
! 2       <!-- dep time -->
| 25       <!-- dep pressure -->
| 20       <!-- dep pressure -->
| 200       <!-- C4F8 flow -->
| 150       <!-- C4F8 flow -->
| 0      <!-- SF6 flow -->
| 0      <!-- SF6 flow -->
| 0    <!-- O2 flow -->
| 0    <!-- O2 flow -->
| 2000      <!-- coil power -->
| 2000      <!-- coil power -->
| 7.0     <!-- etch time -->
| 2.4     <!-- etch time -->
| 25(1.5s) 90>>150       <!-- etch pressure -->
| 26       <!-- etch pressure -->
| 0      <!-- C4F8 flow -->
| 0      <!-- C4F8 flow -->
| 350(1.5s) 550       <!-- SF6 flow -->
| 275       <!-- SF6 flow -->
| 5      <!-- O2 flow -->
| 5      <!-- O2 flow -->
| 2800       <!-- coil power -->
| 2500       <!-- coil power -->
| 120>>140(1.5s) 45     <!-- platen power -->
| 35     <!-- platen power -->
! rowspan="2" | Old      <!-- Showerhead -->
! Old      <!-- Showerhead -->
| rowspan="2" |[[Specific Process Knowledge/Etch/DRIE-Pegasus/showerheadchange/ProcessA | 1]]      <!-- link processes -->
| [[Specific Process Knowledge/Etch/DRIE-Pegasus/showerheadchange/ProcessD/original | 1]]      <!-- link processes -->
| rowspan="2" |    <!-- keywords -->
|   <!-- keywords -->
|-
|-
! Step2 44 cyc <!-- step -->
! rowspan="4" | Process D    <!-- recipe name -->
! 4       <!-- dep time -->
! Original <!-- step -->
| 25       <!-- dep pressure -->
| 0      <!-- chiller temp -->
| 200       <!-- C4F8 flow -->
! 2       <!-- dep time -->
| 20       <!-- dep pressure -->
| 150       <!-- C4F8 flow -->
| 0      <!-- SF6 flow -->
| 0      <!-- SF6 flow -->
| 0    <!-- O2 flow -->
| 0    <!-- O2 flow -->
| 2000      <!-- coil power -->
| 2000      <!-- coil power -->
| 7.0     <!-- etch time -->
| 2.4     <!-- etch time -->
| 25(1.5s) 150       <!-- etch pressure -->
| 26       <!-- etch pressure -->
| 0      <!-- C4F8 flow -->
| 0      <!-- C4F8 flow -->
| 350(1.5s) 550       <!-- SF6 flow -->
| 275       <!-- SF6 flow -->
| 5      <!-- O2 flow -->
| 5      <!-- O2 flow -->
| 2800       <!-- coil power -->
| 2500       <!-- coil power -->
| 140(1.5s) 45     <!-- platen power -->
| 35     <!-- platen power -->
! Old      <!-- Showerhead -->
| [[Specific Process Knowledge/Etch/DRIE-Pegasus/showerheadchange/ProcessD/original | 1]]      <!-- link processes -->
|  <!-- keywords -->
|-
|-
! Step1 11 cyc <!-- step -->
! rowspan="4" | Process D    <!-- recipe name -->
| rowspan="2" |20       <!-- chiller temp -->
! Original <!-- step -->
! 4       <!-- dep time -->
| 0       <!-- chiller temp -->
| 25       <!-- dep pressure -->
! 2       <!-- dep time -->
| 200       <!-- C4F8 flow -->
| 20       <!-- dep pressure -->
| 150       <!-- C4F8 flow -->
| 0      <!-- SF6 flow -->
| 0      <!-- SF6 flow -->
| 0    <!-- O2 flow -->
| 0    <!-- O2 flow -->
| 2000      <!-- coil power -->
| 2000      <!-- coil power -->
| 7.0     <!-- etch time -->
| 2.4     <!-- etch time -->
| 25(1.5s) 90>>150       <!-- etch pressure -->
| 26       <!-- etch pressure -->
| 0      <!-- C4F8 flow -->
| 0      <!-- C4F8 flow -->
| 350(1.5s) 550       <!-- SF6 flow -->
| 275       <!-- SF6 flow -->
| 5      <!-- O2 flow -->
| 5      <!-- O2 flow -->
| 2800       <!-- coil power -->
| 2500       <!-- coil power -->
| 120>>140(1.5s) 45     <!-- platen power -->
| 35     <!-- platen power -->
! rowspan="2" | New       <!-- Showerhead -->
! Old       <!-- Showerhead -->
| rowspan="2" |[[Specific Process Knowledge/Etch/DRIE-Pegasus/showerheadchange/ProcessA | 1]]      <!-- link processes -->
| [[Specific Process Knowledge/Etch/DRIE-Pegasus/showerheadchange/ProcessD/original | 1]]      <!-- link processes -->
| rowspan="2" | Profile improved   <!-- keywords -->
|  <!-- keywords -->
|-
|-
! Step2 44 cyc <!-- step -->
! rowspan="4" | Process D    <!-- recipe name -->
! 4       <!-- dep time -->
! Original <!-- step -->
| 25       <!-- dep pressure -->
| 0      <!-- chiller temp -->
| 200       <!-- C4F8 flow -->
! 2       <!-- dep time -->
| 20       <!-- dep pressure -->
| 150       <!-- C4F8 flow -->
| 0      <!-- SF6 flow -->
| 0      <!-- SF6 flow -->
| 0    <!-- O2 flow -->
| 0    <!-- O2 flow -->
| 2000      <!-- coil power -->
| 2000      <!-- coil power -->
| 7.0     <!-- etch time -->
| 2.4     <!-- etch time -->
| 25(1.5s) 150       <!-- etch pressure -->
| 26       <!-- etch pressure -->
| 0      <!-- C4F8 flow -->
| 0      <!-- C4F8 flow -->
| 350(1.5s) 550       <!-- SF6 flow -->
| 275       <!-- SF6 flow -->
| 5      <!-- O2 flow -->
| 5      <!-- O2 flow -->
| 2800       <!-- coil power -->
| 2500       <!-- coil power -->
| 140(1.5s) 45     <!-- platen power -->
| 35     <!-- platen power -->
! Old      <!-- Showerhead -->
| [[Specific Process Knowledge/Etch/DRIE-Pegasus/showerheadchange/ProcessD/original | 1]]      <!-- link processes -->
|  <!-- keywords -->
|-
|-
|}
|}


== Polysilicon etch ==
== Polysilicon etch ==
Retrieved from "https://labadviser.nanolab.dtu.dk//index.php?title=Specific_Process_Knowledge/Etch/DRIE-Pegasus/showerheadchange"