Specific Process Knowledge/Etch/DRIE-Pegasus/showerheadchange: Difference between revisions
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! rowspan="2" width="100"| Continuous black silicon recipe on blank wafer | ! rowspan="2" width="100"| Continuous black silicon recipe on blank wafer | ||
| rowspan="2" width="100"| 15 mins, -10 degrees, 32 mtorr, 60 sccm SF<sub>6</sub>, 55 sccm O<sub>2</sub>, 70 W platen | | rowspan="2" width="100"| 15 mins, -10 degrees, 32 mtorr, 60 sccm SF<sub>6</sub>, 55 sccm O<sub>2</sub>, 70 W platen | ||
| | | S003900 | ||
| Wafer centre | | Wafer centre | ||
| [[file: | | | ||
[[file:S003900-01.jpg |120px|frameless ]] | |||
[[file:S003900-02.jpg |120px|frameless ]] | |||
[[file:S003900-03.jpg |120px|frameless ]] | |||
[[file:S003900-04.jpg |120px|frameless ]] | |||
[[file:S003900-05.jpg |120px|frameless ]] | |||
[[file:S003900-06.jpg |120px|frameless ]] | |||
| S004679 | | S004679 | ||
| Wafer centre | | Wafer centre | ||
| [[file:S004679 centre.jpg |250px|frameless ]] | | [[file:S004679 centre.jpg |250px|frameless ]] | ||
|- | |- | ||
| | | S003900 | ||
| Wafer edge | | Wafer edge | ||
| [[file:S004592 edge.jpg |250px|frameless ]] | | [[file:S004592 edge.jpg |250px|frameless ]] | ||
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| [[file:S004679 edge.jpg |250px|frameless ]] | | [[file:S004679 edge.jpg |250px|frameless ]] | ||
|- | |- | ||
! rowspan="2" width="100"| | ! rowspan="2" width="100"| Continuous isotropic silicon etch called isoslow7 | ||
| rowspan="2" width="100"| | | rowspan="2" width="100"| 1 minute, 10 degrees, 10 mTorr, 80 SF<sub>6</sub>, 150 W coil, 3 W platen | ||
| | | S003900 | ||
| | | 4" wafer | ||
| | | | ||
| S00XXX | | S00XXX | ||
Revision as of 15:08, 16 December 2014
Comparison of continuous processes
| Process | Before | After | |||||
|---|---|---|---|---|---|---|---|
| Name/Type | Description | Wafer ID | Comment | SEM images | Wafer ID | Comment | SEM images |
| Continuous black silicon recipe on blank wafer | 15 mins, -10 degrees, 32 mtorr, 60 sccm SF6, 55 sccm O2, 70 W platen | S003900 | Wafer centre |
|
S004679 | Wafer centre | 
|
| S003900 | Wafer edge | 
|
S004679 | Wafer edge | 
| ||
| Continuous isotropic silicon etch called isoslow7 | 1 minute, 10 degrees, 10 mTorr, 80 SF6, 150 W coil, 3 W platen | S003900 | 4" wafer | S00XXX | Wafer centre | File:S00XX centre.jpg | |
| S00XXXx | Wafer edge | File:S00XXX dge.jpg | S00XXX | Wafer edge | File:S00xxxx edge.jpg | ||
Comparison of switched processes
| Recipe | Name | Temp. | Deposition step | Etch step | Comments | |||||||||||||
|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|
| Time | Pres. | C4F8 | SF6 | O2 | Coil | Time | Pres. | C4F8 | SF6 | O2 | Coil | Platen | Showerhead | Runs | Key words | |||
| Process A | Step1 11 cyc | 20 | 4 | 25 | 200 | 0 | 0 | 2000 | 7.0 | 25(1.5s) 90>>150 | 0 | 350(1.5s) 550 | 5 | 2800 | 120>>140(1.5s) 45 | Old | 1 | |
| Step2 44 cyc | 4 | 25 | 200 | 0 | 0 | 2000 | 7.0 | 25(1.5s) 150 | 0 | 350(1.5s) 550 | 5 | 2800 | 140(1.5s) 45 | |||||
| Step1 11 cyc | 20 | 4 | 25 | 200 | 0 | 0 | 2000 | 7.0 | 25(1.5s) 90>>150 | 0 | 350(1.5s) 550 | 5 | 2800 | 120>>140(1.5s) 45 | New | 1 | ||
| Step2 44 cyc | 4 | 25 | 200 | 0 | 0 | 2000 | 7.0 | 25(1.5s) 150 | 0 | 350(1.5s) 550 | 5 | 2800 | 140(1.5s) 45 | |||||
| Recipe description | Name | Temp. | Deposition step | Etch step | Comments | |||||||||||||
|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|
| Time | Pres. | C4F8 | SF6 | O2 | Coil | Time | Pres. | C4F8 | SF6 | O2 | Coil | Platen | Showerhead | Runs | Key words | |||
| Polysilicon etch | polySi etch DUV mask | 30 | 2.3 | 10 | 50 | 0 | 0 | 600 | 5.0 | 10 | 20 | 60 | 5 | 400 | 40 | Old | 1 | Slightly over-etching to ensure complete absence of grass |
| polySi etch DUV mask | 30 | 2.3 | 10 | 50 | 0 | 0 | 600 | 5.0 | 10 | 20 | 60 | 5 | 400 | 40 | New | 1 | ||
| Cpoly1 | 30 | 1.2 | 10 | 50 | 0 | 0 | 600 | 5.0 | 10 | 20 | 60 | 5 | 400 | 40 | New | 1 | Very aggressive, unusable | |
| Cpoly2 | 30 | 1.4 | 10 | 50 | 0 | 0 | 600 | 5.0 | 10 | 20 | 60 | 5 | 400 | 40 | New | 1 | ||
| Cpoly3 | 30 | 1.6 | 10 | 50 | 0 | 0 | 600 | 5.0 | 10 | 20 | 60 | 5 | 400 | 40 | New | 1 | ||
| Cpoly4 | 30 | 1.8 | 10 | 50 | 0 | 0 | 600 | 5.0 | 10 | 20 | 60 | 5 | 400 | 40 | New | 1 | ||
| Cpoly5 | 30 | 2.0 | 10 | 50 | 0 | 0 | 600 | 5.0 | 10 | 20 | 60 | 5 | 400 | 40 | New | 1 | ||