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Specific Process Knowledge/Etch/DRIE-Pegasus/showerheadchange: Difference between revisions

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Jmli (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers
4,569 edits
Jmli (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers
4,569 edits
Line 55: Line 55:
{| border="1" cellpadding="1" cellspacing="0" style="text-align:center;"
{| border="1" cellpadding="1" cellspacing="0" style="text-align:center;"
|-
|-
! rowspan="2" width="100"| Recipe description
! rowspan="2" width="100"| Recipe
! rowspan="2" width="20"| Name
! rowspan="2" width="20"| Name
! rowspan="2" width="20"| Temp.
! rowspan="2" width="20"| Temp.
Line 80: Line 80:
|-
|-
! rowspan="7" | Process A    <!-- recipe name -->
! rowspan="7" | Process A    <!-- recipe name -->
! Step 1 <!-- step -->
! Step1 11 cyc <!-- step -->
| 20      <!-- chiller temp -->
| 20      <!-- chiller temp -->
! 4      <!-- dep time -->
! 4      <!-- dep time -->
Line 96: Line 96:
| 120>>140(1.5s) 45      <!-- platen power -->
| 120>>140(1.5s) 45      <!-- platen power -->
! Old      <!-- Showerhead -->
! Old      <!-- Showerhead -->
| [[Specific Process Knowledge/Etch/DRIE-Pegasus/showerheadchange/ProcessA | 1]]      <!-- link processes -->
| rowspan="2" |[[Specific Process Knowledge/Etch/DRIE-Pegasus/showerheadchange/ProcessA | 1]]      <!-- link processes -->
|    <!-- keywords -->
|    <!-- keywords -->
|-
|-
| polySi etch DUV mask  <!-- step -->
! rowspan="7" | Process A    <!-- recipe name -->
| 30       <!-- chiller temp -->
! Step2 44 cyc <!-- step -->
| 2.3       <!-- dep time -->
| 20       <!-- chiller temp -->
| 10       <!-- dep pressure -->
! 4       <!-- dep time -->
| 50       <!-- C4F8 flow -->
| 25       <!-- dep pressure -->
| 200       <!-- C4F8 flow -->
| 0      <!-- SF6 flow -->
| 0      <!-- SF6 flow -->
| 0    <!-- O2 flow -->
| 0    <!-- O2 flow -->
| 600       <!-- coil power -->
| 2000       <!-- coil power -->
| 5.0      <!-- etch time -->
| 7.0      <!-- etch time -->
| 10       <!-- etch pressure -->
| 25(1.5s) 150       <!-- etch pressure -->
| 20       <!-- C4F8 flow -->
| 0       <!-- C4F8 flow -->
| 60       <!-- SF6 flow -->
| 350(1.5s) 550       <!-- SF6 flow -->
| 5      <!-- O2 flow -->
| 5      <!-- O2 flow -->
| 400       <!-- coil power -->
| 2800       <!-- coil power -->
| 40     <!-- platen power -->
| 140(1.5s) 45     <!-- platen power -->
! New       <!-- Showerhead -->
! Old       <!-- Showerhead -->
| [[Specific Process Knowledge/Etch/DRIE-Pegasus/showerheadchange/polySi/Cduv | 1]]      <!-- link processes -->
|    <!-- keywords -->
|    <!-- keywords -->
|-
|-
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