Specific Process Knowledge/Etch/IBE⁄IBSD Ionfab 300: Difference between revisions
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===Etch=== | ===Etch=== | ||
*[[/IBE process trends|Some general process trends]] | *[[/IBE process trends|Some general process trends]] | ||
*[[/SIMS settings|SIMS settings]] | |||
*Results from the acceptance test: | *Results from the acceptance test: | ||
**[[/IBE Au etch#Results from the acceptance test in February 2011|Au etch with zep520A as masking material]] | **[[/IBE Au etch#Results from the acceptance test in February 2011|Au etch with zep520A as masking material]] | ||