Specific Process Knowledge/Lithography/Coaters: Difference between revisions
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* UV sensative resist: AZ5214E, AZMiR701, AZ nLoF 2020 | * UV sensative resist: AZ5214E, AZMiR701, AZ nLoF 2020 | ||
* E-beam resits: ZEP520A, PMMA, HSQ | * E-beam resits: ZEP520A, PMMA, HSQ | ||
* BCB( bisbenzocyclobutene) | * BCB (bisbenzocyclobutene) | ||
* Diblock copolymer Poly(styrene-b-methyl methacrylate) P(S-b-PMMA) | * Diblock copolymer Poly(styrene-b-methyl methacrylate) P(S-b-PMMA) | ||
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