Specific Process Knowledge/Lithography/UVExposure: Difference between revisions

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@@ Line 19: / Line 19: @@
 *Top Side Alignment
 *Back Side Alignment
 *UV exposure
+|style="background:WhiteSmoke; color:black"|
+*Top Side Alignment
+*Back Side Alignment
+*UV exposure
 |style="background:WhiteSmoke; color:black"|
 *Top Side Alignment
@@ Line 35: / Line 39: @@
 |style="background:WhiteSmoke; color:black"|
 *1.25µm down to 1.0µm
+|style="background:WhiteSmoke; color:black"|
+*1.25µm down to 0.5µm
 |style="background:WhiteSmoke; color:black"|
 *1.25µm
@@ Line 43: / Line 49: @@
 |style="background:LightGrey; color:black"|Exposure light/filters/spectrum
 |style="background:WhiteSmoke; color:black"|
-*350W Hg-lamp
+*350W Hg lamp
 *i-line filter (365nm notch filter), intensity in Constant Intensity mode: 7mW/cm<sup>2</sup> @ 365nm
 *303nm filter optional
 |style="background:WhiteSmoke; color:black"|
-*350W Hg-lamp
+*500W Hg-Xe lamp
+*i-line filter (365nm notch filter), intensity in Constant Intensity mode: ?mW/cm<sup>2</sup> @ 365nm
+*UV350 optics optional
+*UV250 optics optional
+|style="background:WhiteSmoke; color:black"|
+*350W Hg lamp
 *SU8 filter (long-pass), intensity in Constant Power mode: 7mW/cm<sup>2</sup> @ 365nm
 *i-line filter optional
 |style="background:WhiteSmoke; color:black"|
-*350W Hg-lamp
+*350W Hg lamp
 *the entire 350W Hg-lamp spectrum, intensity in Constant Power mode: 5mW/cm<sup>2</sup> @ 365nm
 |style="background:WhiteSmoke; color:black"|
@@ Line 60: / Line 71: @@
 |-
 |style="background:LightGrey; color:black"|Exposure mode
+|style="background:WhiteSmoke; color:black"|
+*proximity, soft, hard, vacuum contact
 |style="background:WhiteSmoke; color:black"|
 *proximity, soft, hard, vacuum contact
@@ Line 74: / Line 87: @@
 |style="background:LightGrey; color:black"|Batch size
 |style="background:WhiteSmoke; color:black"|
-*<nowiki>1</nowiki> small sample
+*1 small sample
-*<nowiki>1</nowiki> 50 mm wafers
+*1 50 mm wafer
-*<nowiki>1</nowiki> 100 mm wafers
+*1 100 mm wafer
-*<nowiki>1</nowiki> 150 mm wafers
+*1 150 mm wafer
+|style="background:WhiteSmoke; color:black"|
+*1 small sample
+*1 50 mm wafer
+*1 100 mm wafer
+*1 150 mm wafer
 |style="background:WhiteSmoke; color:black"|
-*<nowiki>1</nowiki> 50 mm wafers
+*1 50 mm wafers
-*<nowiki>1</nowiki> 100 mm wafers
+*1 100 mm wafers
-*<nowiki>25</nowiki> 150 mm wafers with automatic handling
+*25 150 mm wafers with automatic handling
 |style="background:WhiteSmoke; color:black"|
-*<nowiki>1</nowiki> small samples
+*1 small sample
-*<nowiki>1</nowiki> 50 mm wafers
+*1 50 mm wafer
-*<nowiki>1</nowiki> 100 mm wafers
+*1 100 mm wafer
-*<nowiki>1</nowiki> 150 mm wafers
+*1 150 mm wafer
 |style="background:WhiteSmoke; color:black"|
 *all sizes up to 8inch
@@ Line 94: / Line 112: @@
 *All cleanroom materials
 *Dedicated 2inch chuck for III-V materials
+|style="background:WhiteSmoke; color:black"|
 |style="background:WhiteSmoke; color:black"|
 *All cleanroom materials except III-V materials