Specific Process Knowledge/Thin film deposition: Difference between revisions

Revision as of 09:32, 5 November 2014

3rd Level - Material/Method

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Dielectrica	Semicondutors	Metals	Alloys	Transparent conductive oxides	Polymers
Silicon Nitride - and oxynitride Silicon Oxide Titanium Oxide Alumina (Al2O3, Aluminium Oxide) Tantalum (Ta2O5, Tantalum pentoxide) Cromia (Cr2O3, Chromium Oxide)	Silicon Germanium Zinc Oxide (ZnO)	Aluminium Titanium Chromium Cobalt Nickel Copper Molybdenum Palladium Silver Tin Tantalum Tungsten Platinum Gold Iron Magnesium Niobium Ruthenium /Lesker Cobalt Cobalt Cobalt	TiW alloy (10%/90% by weight) NiCr alloy AlTi alloy NiV alloy AlCu CoFe CuTi FeMn MnIr NiCo NiFe Cobalt Cobalt	ITO	SU8 Antistiction coating Topas PMMA

PVD	LPCVD	PECVD	ALD	Coaters	Others
Alcatel - E-beam evaporator and sputter tool Lesker - Sputter tool PVD co-sputter/evaporation - E-beam evaporator and multiple wafer tool Wordentec - E-beam evaporator, sputter and thermal evaporator Physimeca - E-beam evaporator (III-V lab) IBE/IBSD Ionfab 300 - Sputter deposition of high quality optical layers and milling/etching Sputter coater Hummer - Gold sputtering system Balzer Sputter coater - Gold sputtering system III-V Dielectric evaporator - E-beam evaporation tool	Furnace LPCVD Nitride (4" and 6") - Deposition of silicon nitride Furnace LPCVD Polysilicon (4" and 6") Deposition of polysilicon Furnace LPCVD TEOS (4") - Deposition of silicon oxide	PECVD - Plasma Enhanced Chemical Vapor deposition Black Magic PECVD - Black Magic PECVD (Carbon)	ALD Picosun R200 - Atomic layer deposition	See the Lithography/Coaters page for coating polymers	MVD - Molecular Vapor Deposition Electroplating-Ni - Electrochemical deposition of nickel MOCVD - Epitaxial growth - Ask the department of photonics

@@ Line 17: / Line 17: @@
 [[/Deposition of Silicon Oxide|Silicon Oxide]]<br/>
 [[/Deposition of Titanium Oxide|Titanium Oxide]]<br/>
+[[/Lesker|Alumina (Al2O3, Aluminium Oxide)]]<br/>
+[[/Lesker|Tantalum (Ta2O5, Tantalum pentoxide)]]<br/>
+[[/Lesker|Cromia (Cr2O3, Chromium Oxide)]]<br/>
 |style="background: #DCDCDC"|
 [[/Deposition of Silicon|Silicon]] <br/>
 [[/Deposition of Germanium|Germanium]]
+[[/Lesker|Zinc Oxide (ZnO)]]<br/>
 |style="background: LightGray"|
 [[/Deposition of Aluminium|Aluminium]] <br/>
 [[/Deposition of Titanium|Titanium]]<br/>
 [[/Deposition of Chromium|Chromium]]<br/>
+[[/Lesker|Cobalt]]<br/>
 [[/Deposition of Nickel|Nickel]]<br/>
 [[/Deposition of Copper|Copper]]<br/>
@@ Line 34: / Line 39: @@
 [[/Deposition of Platinum|Platinum]]<br/>
 [[/Deposition of Gold|Gold]]<br/>
+[[/Lesker|Iron]]<br/>
+[[/Lesker|Magnesium]]<br/>
+[[/Lesker|Niobium]]<br/>
+[[/Lesker|Ruthenium]]<br/>
+[[/Lesker|/Lesker]]<br/>
+[[/Lesker|Cobalt]]<br/>
+[[/Lesker|Cobalt]]<br/>
+[[/Lesker|Cobalt]]<br/>
 |style="background: #DCDCDC"|
 [[/Deposition of TiW|TiW]] alloy (10%/90% by weight) <br/>
@@ Line 39: / Line 52: @@
 [[/Deposition of AlTi|AlTi]] alloy <br/>
 [[/Deposition of NiV|NiV]] alloy
+[[/Lesker|AlCu]]<br/>
+[[/Lesker|CoFe]]<br/>
+[[/Lesker|CuTi]]<br/>
+[[/Lesker|FeMn]]<br/>
+[[/Lesker|MnIr]]<br/>
+[[/Lesker|NiCo]]<br/>
+[[/Lesker|NiFe]]<br/>
+[[/Lesker|Cobalt]]<br/>
+[[/Lesker|Cobalt]]<br/>
 |style="background: LightGray"|
 ITO