Specific Process Knowledge/Thin film deposition: Difference between revisions

@@ Line 17: / Line 17: @@
 [[/Deposition of Silicon Oxide|Silicon Oxide]]<br/>
 [[/Deposition of Titanium Oxide|Titanium Oxide]]<br/>
+[[/Lesker|Alumina (Al2O3, Aluminium Oxide)]]<br/>
+[[/Lesker|Tantalum (Ta2O5, Tantalum pentoxide)]]<br/>
+[[/Lesker|Cromia (Cr2O3, Chromium Oxide)]]<br/>
 |style="background: #DCDCDC"|
 [[/Deposition of Silicon|Silicon]] <br/>
 [[/Deposition of Germanium|Germanium]]
+[[/Lesker|Zinc Oxide (ZnO)]]<br/>
 |style="background: LightGray"|
 [[/Deposition of Aluminium|Aluminium]] <br/>
 [[/Deposition of Titanium|Titanium]]<br/>
 [[/Deposition of Chromium|Chromium]]<br/>
+[[/Lesker|Cobalt]]<br/>
 [[/Deposition of Nickel|Nickel]]<br/>
 [[/Deposition of Copper|Copper]]<br/>
@@ Line 34: / Line 39: @@
 [[/Deposition of Platinum|Platinum]]<br/>
 [[/Deposition of Gold|Gold]]<br/>
+[[/Lesker|Iron]]<br/>
+[[/Lesker|Magnesium]]<br/>
+[[/Lesker|Niobium]]<br/>
+[[/Lesker|Ruthenium]]<br/>
+[[/Lesker|/Lesker]]<br/>
+[[/Lesker|Cobalt]]<br/>
+[[/Lesker|Cobalt]]<br/>
+[[/Lesker|Cobalt]]<br/>
 |style="background: #DCDCDC"|
 [[/Deposition of TiW|TiW]] alloy (10%/90% by weight) <br/>
@@ Line 39: / Line 52: @@
 [[/Deposition of AlTi|AlTi]] alloy <br/>
 [[/Deposition of NiV|NiV]] alloy
+[[/Lesker|AlCu]]<br/>
+[[/Lesker|CoFe]]<br/>
+[[/Lesker|CuTi]]<br/>
+[[/Lesker|FeMn]]<br/>
+[[/Lesker|MnIr]]<br/>
+[[/Lesker|NiCo]]<br/>
+[[/Lesker|NiFe]]<br/>
+[[/Lesker|Cobalt]]<br/>
+[[/Lesker|Cobalt]]<br/>
 |style="background: LightGray"|
 ITO