Specific Process Knowledge/Characterization/AFM: Atomic Force Microscopy/AFM Icon Acceptance: Difference between revisions

From LabAdviser
← Older editNewer edit →
VisualWikitext
Bghe (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, Bureaucrats, Administrators
7,018 edits
Bghe (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, Bureaucrats, Administrators
7,018 edits
Line 129: Line 129:


===Graphene KPFM measurement===
===Graphene KPFM measurement===
[[File:AFM Icon KPFM1.jpg|500px]][[File:AFM Icon KPFM2.jpg|275px]]
[[File:AFM Icon KPFM1.jpg|800px]][[File:AFM Icon KPFM2.jpg|440px]]

Revision as of 13:12, 4 November 2014

Feedback to this page: click here

THIS PAGE IS UNDER CONSTRUCTION

Accessories following the system

Extra chuck

We have two chucks:

  • A symmetric chuck that handles up to 210mm wafers and 15mm thick
  • An asymmetric chuck that handles up to ~4" wafer (but not small pieces) - using this a whole 4" can be accessed without rotating the sample.


Holders

  • Magnetic sample holder + magnetic discs + double sided tape
  • Holder for vertical profile scans


Modes included

  • ScanAsyst
  • TappingMode (air)
  • Contact Mode
  • Lateral Force Microscopy
  • PhaseImaging
  • Lift mode
  • MFM
  • Force Spectroscopy
  • Force volume
  • EFM
  • surface potential
  • Torsional Resonance Mode
  • Piezoresponse Microscopy
  • Force spectroscopy


Extra modes:

  • PeakForce KPFM package (incl extra box for high voltage PF KPFM)
  • PFQNM package
  • Microscope Image Registration and Overlay (MIRO) software

Probes

Probes that followed the system (we may not have them anymore!)

ScanAsyst mode Tapping mode Contact mode PF-KPFM
Generel description Generel description Generel description
Probes that followed the system
  • ScanAsyst air 30ps
  • ScanAsyst fluid 10ps
  • ScanAsyst fluid + 10ps
  • MPP-11100-10
  • MPP-21100-10
  • MPP-11120-10 RTESPA
  • TESPA-V2 10ps
  • OTESPA-R3 10ps
  • High Aspect ratio probes 1:15: FIB6-400A 5ps
  • MPP-12120 10ps. Tap150A
  • MPP-13120-10 TAP525A
  • SNL-10 20ps
  • SCM-PIT 10ps
  • PFQNE-Al 10ps


Samples

  • QC grid: VGRP-15M 10µm pitch and depth reference 178nm
  • PF KPFM-SMPL Kelvin probe Sample: Al + Au on Si

Calibration samples for getting quantitative modulus measurements:

  1. PDMS-soft-1-12M: PDMS gel 2.5MPa
  2. PDMS-soft-2-12M: PDMS gel 3.5MPa
  3. PSFilm-12M: Polystyrene filem
  4. FSilica-12M: Fused Silica
  5. Sapphire-12M: Sapphire
  6. RS-12M: Ti roughness sample
  7. HOPG-12M: Highly Orientated Pyrolytic Graphite
  8. PS-LDPE: Harmonix training


  • HOPG: Highly Oriented Pyrolytic Graphite

Acceptance tests done

Noise test

Roughness

HAR: 200nm wide 400nm deep

HAR: 2µm wide 6µm deep

Graphene KPFM measurement

Retrieved from "https://labadviser.nanolab.dtu.dk//index.php?title=Specific_Process_Knowledge/Characterization/AFM:_Atomic_Force_Microscopy/AFM_Icon_Acceptance&oldid=16856"