Jump to content

Specific Process Knowledge/Characterization/AFM: Atomic Force Microscopy/Workspaces: Difference between revisions

← Older editNewer edit →
VisualWikitext
Bghe (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, Bureaucrats, Administrators
7,317 edits
Bghe (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, Bureaucrats, Administrators
7,317 edits
Line 35: Line 35:
|-style="background:LightGrey; color:black"
|-style="background:LightGrey; color:black"
!Recommended probes
!Recommended probes
|
|ScanAsyst in air
*A
|ScanAsyst in air
*B
|ScanAsyst in air for ScanAsyst mode
|
TAP300Al-G for tapping mode
*A
|AR5T-NCH
*B
FIB6
|
|
|-
|-


Line 49: Line 47:
!Recommended experiment/Workspace
!Recommended experiment/Workspace
|
|
*A
'''ScanAsyst in air - roughness (<10nm)'''
*B
*C
|
*A
|
|
|
'''ScanAsyst in air - standards'''
|'''ScanAsyst in air - steep steps'''
|'''Tapping mode in air 300nm''' (for steps <~1µm)
'''Tappping mode in air 6µm''' (for steps >1~µm)
|-
|-


Retrieved from "https://labadviser.nanolab.dtu.dk//index.php?title=Specific_Process_Knowledge/Characterization/AFM:_Atomic_Force_Microscopy/Workspaces"