Specific Process Knowledge/Lithography/Development: Difference between revisions
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'''Standard process recipes''' | '''Standard process recipes''' | ||
*nLoF_40x2: double puddle, 40s. For development of AZ nLOF 2020 resist. | *nLoF_40x2: double puddle, 40s each. For development of AZ nLOF 2020 resist. | ||
*MiR701 60s: single puddle, 60s. For development of AZ MiR 701 resist. | *MiR701 60s: single puddle, 60s. For development of AZ MiR 701 resist. | ||
*DUV 60s: single puddle, 60s. For development of DUV resists. | *DUV 60s: single puddle, 60s. For development of DUV resists. | ||