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Specific Process Knowledge/Lithography/Development/Developer TMAH UV-lithography processing: Difference between revisions

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==Puddle Development==
==Puddle Development==
Development on Developer TMAH UV-lithography is divided into the following steps: Pre-wet, puddle dispense, development, spin-off, and finally rinse and dry.  
Development on Developer TMAH UV-lithography is divided into the following steps: Pre-wet, puddle dispense, development, and spin-off.
 
Pre-wet may be done using developer or DI water, or it may be skipped.
 
Puddle dispense is done by dispensing developer (AZ 726 MIF) to the center of the wafer at a rate of approximately 225 ml/min while the wafer is rotating slowly (30 rpm).


==Rinse==
==Rinse==
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