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Specific Process Knowledge/Lithography/UVExposure: Difference between revisions

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DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab307-labadviser-users-34891
3,531 edits
Taran (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab307-labadviser-users-34891
3,531 edits
Line 16: Line 16:
|style="background:LightGrey; color:black"|  
|style="background:LightGrey; color:black"|  
|style="background:WhiteSmoke; color:black"|
|style="background:WhiteSmoke; color:black"|
*TS and BS Alignment
*Top Side Alignment
*Back Side Alignment
*UV exposure  
*UV exposure  
|style="background:WhiteSmoke; color:black"|
|style="background:WhiteSmoke; color:black"|
*TS and BS Alignment
*Top Side Alignment
*Back Side Alignment
*UV exposure  
*UV exposure  
|style="background:WhiteSmoke; color:black"|
|style="background:WhiteSmoke; color:black"|
*TS Alignment
*Top Side Alignment
*UV exposure
*UV exposure
|style="background:WhiteSmoke; color:black"|
|style="background:WhiteSmoke; color:black"|
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