Specific Process Knowledge/Doping: Difference between revisions
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*900°C - 1150°C | *900°C - 1150°C | ||
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* | *1050°C - 1125°C | ||
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*300°C | *300°C | ||
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*Phospor (POCL) | *Phospor (POCL) | ||
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*Boron | *Boron (solid source wafers containing B<sub>2</sub>O<sub>3</sub>) | ||
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*Phosphor (PH<sub>3</sub>) | *Phosphor (PH<sub>3</sub>) | ||