Specific Process Knowledge/Etch/Wet Silicon Oxide Etch (BHF): Difference between revisions
| Line 17: | Line 17: | ||
'''Process information:''' <br> | '''Process information:''' <br> | ||
[[/BHF etch rates|BHF etch rates]] | See more etch rates in HF solutions here:[[/BHF etch rates|BHF etch rates]] | ||
| Line 64: | Line 64: | ||
*Isotropic | *Isotropic | ||
|- | |- | ||
|style="background:LightGrey; color:black"| | |style="background:LightGrey; color:black"|Etch rates | ||
|style="background:WhiteSmoke; color:black"| | |style="background:WhiteSmoke; color:black"| | ||
*Wet thermal oxide:75-80nm/min | *Wet thermal oxide:75-80nm/min | ||