Specific Process Knowledge/Lithography/Development: Difference between revisions
| Line 40: | Line 40: | ||
*AZ 4562 | *AZ 4562 | ||
*DUV resists | *DUV resists | ||
Post-exposure baking | Post-exposure baking | ||
| Line 40: | Line 40: | ||
*AZ 4562 | *AZ 4562 | ||
*DUV resists | *DUV resists | ||
Post-exposure baking | Post-exposure baking | ||