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Specific Process Knowledge/Lithography/CSAR: Difference between revisions

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{|style="border: 5px solid black;"  style="width: 80%;" align="center"
{|style="border: 5px solid black;"  style="width: 80%;" align="center"
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| [[File:6_13_30nm_270_shot14_Lines.png|250px]]
| [[File:6_13_30nm_270_shot14_Lines.png|250px]]
| [[File:6_13_30nm_300_shot14_Lines.png|250px]]
| [[File:6_13_30nm_300_shot14_Lines.png|250px]]
| ACHK NOT READY
|-
|}
{|style="border: 5px solid black;"  style="width: 80%;" align="center"
|-
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|-style="background:Black; color:White"
!colspan="4"|Wafer 6.13, 50 nm exposed pattern, shot pitch 7 nm
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! 270 [muC/cm2]
! 300 [muC/cm2]
! ACHK
|-
| [[File:6_13_50nm_270_shot14.png|250px]]
| [[File:6_13_30nm_300_shot14.png|250px]]
|
|-
| [[File:6_13_50nm_270_shot14_Lines.png|250px]]
| [[File:6_13_30nm_300_shot14_Lines.png|250px]]
| ACHK NOT READY
|-
| [[File:6_13_50nm_270_shot14_Holes.png|250px]]
| [[File:6_13_30nm_300_shot14_Holes.png|250px]]
| ACHK NOT READY
|-
| [[File:6_13_50nm_270_shot14_Pillars.png|250px]]
| [[File:6_13_30nm_300_shot14_Pillars.png|250px]]
| ACHK NOT READY
|-
| [[File:6_13_50nm_270_shot14_Holes2.png|250px]]
| [[File:6_13_30nm_300_shot14_Holes2.png|250px]]
| ACHK NOT READY  
| ACHK NOT READY  
|-
|-
Retrieved from "https://labadviser.nanolab.dtu.dk//index.php?title=Specific_Process_Knowledge/Lithography/CSAR"