Specific Process Knowledge/Etch/IBE⁄IBSD Ionfab 300: Difference between revisions
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==IBE/IBSD Ionfab 300: milling, dry etching and deposition in the same tool== | ==IBE/IBSD Ionfab 300: milling, dry etching and deposition in the same tool== | ||
[[Image:IBE_IBSD_udstyret_i_RR1.jpg|300x300px|thumb|IBE and IBSD: positioned in cleanroom A-1]] | [[Image:IBE_IBSD_udstyret_i_RR1.jpg|300x300px|thumb|IBE and IBSD: positioned in cleanroom A-1]] | ||
IBE/IBSD Ionfab 300 was manufactored by Oxford Instruments Plasma Tecchnology. It was installed at Danchip in 2011. | |||