Jump to content

Specific Process Knowledge/Thin film deposition: Difference between revisions

← Older editNewer edit →
VisualWikitext
Pevo (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers
2,366 edits
Pevo (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers
2,366 edits
Line 54: Line 54:
| align="left" valign="top" style="background:#DCDCDC;"|''' LPCVD'''
| align="left" valign="top" style="background:#DCDCDC;"|''' LPCVD'''
| align="left" valign="top" style="background:LightGray"|''' PECVD'''
| align="left" valign="top" style="background:LightGray"|''' PECVD'''
| align="left" valign="top" style="background:#DCDCDC;"|''' Coaters'''
| align="left" valign="top" style="background:#DCDCDC;"|''' ALD'''
| align="left" valign="top" style="background:LightGray"|''' Others'''
| align="left" valign="top" style="background:LightGray"|''' Coaters'''
| align="left" valign="top" style="background:#DCDCDC;"|''' Others'''
 
 


|-valign="top"
|-valign="top"
Line 69: Line 72:
|style="background: #DCDCDC"|
|style="background: #DCDCDC"|
*[[Specific_Process_Knowledge/Thin_film_deposition/Deposition_of_Silicon_Nitride/Deposition_of_Silicon_Nitride_using_LPCVD|Furnace LPCVD Nitride (4" and 6")]] - ''Deposition of silicon nitride''
*[[Specific_Process_Knowledge/Thin_film_deposition/Deposition_of_Silicon_Nitride/Deposition_of_Silicon_Nitride_using_LPCVD|Furnace LPCVD Nitride (4" and 6")]] - ''Deposition of silicon nitride''
*[[/Furnace LPCVD PolySilicon|Furnace LPCVD Polysilicon (4" and 6")]] - ''Deposition of polysilicon''
*[[/Furnace LPCVD PolySilicon|Furnace LPCVD Polysilicon (4" and 6")]] ''Deposition of polysilicon''
*[[/Furnace LPCVD TEOS|Furnace LPCVD TEOS (4")]] - ''Deposition of silicon oxide''
*[[/Furnace LPCVD TEOS|Furnace LPCVD TEOS (4")]] - ''Deposition of silicon oxide''
|style="background: LightGray"|
|style="background: LightGray"|
Line 75: Line 78:
*[[/Black Magic PECVD|Black Magic PECVD]] - ''Black Magic PECVD (Carbon)''
*[[/Black Magic PECVD|Black Magic PECVD]] - ''Black Magic PECVD (Carbon)''
|style="background: #DCDCDC"|
|style="background: #DCDCDC"|
*[[ALD Picosun R200|ALD Picosun R200]] - Atomic layer deposition
|style="background: LightGray"|
See the [[Specific Process Knowledge/Lithography/Coaters |Lithography/Coaters]] page for coating polymers
See the [[Specific Process Knowledge/Lithography/Coaters |Lithography/Coaters]] page for coating polymers
|style="background: LightGray"|
|style="background: #DCDCDC"|
*[[/MVD|MVD]] - ''Molecular Vapor Deposition''
*[[/MVD|MVD]] - ''Molecular Vapor Deposition''
*[[/Electroplating-Ni|Electroplating-Ni]] - ''Electrochemical deposition of nickel''
*[[/Electroplating-Ni|Electroplating-Ni]] - ''Electrochemical deposition of nickel''
|-
|-
|}
|}
Retrieved from "https://labadviser.nanolab.dtu.dk//index.php?title=Specific_Process_Knowledge/Thin_film_deposition"