Specific Process Knowledge/Lithography/Development: Difference between revisions
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===Process information=== | ===Process information=== | ||
'''Standard development time using vigorous agitation:''' | '''Standard development time using vigorous agitation:''' | ||
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'''AZ 4562:''' | '''AZ 4562:''' | ||
*10µm resist: 5 min | *10µm resist: 5 min | ||
'''Standard development procedure''' | |||
*Before using one of developer baths, please check the "Litho4_Dev-7up-KOH" logbook to find out when they were last used. A fresh bath can be reused without problems. | |||
*The main rule is a developer made yesterday must be changed. | |||
*During development, agitate the substrates by moving the carrier up and down. | |||
*Rinse substrates with water for 4-5 min. after development. | |||
*Spin-dry substrates or dry with nitrogen gun after rinsing. | |||
====Procedure for making a new developer==== | ====Procedure for making a new developer==== | ||