Specific Process Knowledge/Lithography/UVExposure: Difference between revisions
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*365 nm (i-line), light intensity 7,0 mW/cm<sup>2</sup> in Constant Intansity (CI2) mode | *365 nm (i-line), light intensity 7,0 mW/cm<sup>2</sup> in Constant Intansity (CI2) mode | ||
*303 nm filters | *303 nm filters optional | ||
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|style="background:LightGrey; color:black"|Minimum structure size | |style="background:LightGrey; color:black"|Minimum structure size | ||
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