Specific Process Knowledge/Lithography/UVExposure: Difference between revisions

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 Equipment info in [http://labmanager.danchip.dtu.dk/function.php?module=Machine&view=view&mach=201 LabManager]
+===Process information===
+'''Positive tone resists:'''
+'''AZ 5214E and AZ 4562'''
+Compared to exposure on KS-Aligner, the dose on Aligner-6inch is halved.
+*1.5µm: 24.5 mJ/cm<sup>2</sup> corresponding to 3.5 seconds exposure at 7 mW/cm<sup>2</sup>.
+*10µm: ~140 mJ/cm<sup>2</sup> corresponding to ~20 seconds exposure at 7 mW/cm<sup>2</sup>.
+'''AZ MiR 701''' ''Preliminary results''
+Compared to exposure on KS-Aligner, the dose on Aligner-6inch is one fifth.
+*1.5µm: 31.5 mJ/cm<sup>2</sup> corresponding to 4.5 seconds exposure at 7 mW/cm<sup>2</sup>.
+'''Negative tone resists'''
+'''AZ 5214E image reversal'''
+Compared to exposure on KS-Aligner, the dose on Aligner-6inch is halved.
+*1.5µm: 10.5 mJ/cm<sup>2</sup> corresponding to 1.5 seconds exposure at 7 mW/cm<sup>2</sup>.
+*2.2µm: 12 mJ/cm<sup>2</sup> corresponding to 1.7 seconds exposure at 7 mW/cm<sup>2</sup>.
+'''AZ nLOF 20XX''' ''Preliminary results''
+Compared to exposure on KS-Aligner, the dose on Aligner-6inch is the same.
+*1.5µm: 42 mJ/cm<sup>2</sup> corresponding to 6 seconds exposure at 7 mW/cm<sup>2</sup>.
+*2µm: 49 mJ/cm<sup>2</sup> corresponding to 7 seconds exposure at 7 mW/cm<sup>2</sup>.
+*3µm: 56 mJ/cm<sup>2</sup> corresponding to 8 seconds exposure at 7 mW/cm<sup>2</sup>.
+*4.3µm: 70 mJ/cm<sup>2</sup> corresponding to 10 seconds exposure at 7 mW/cm<sup>2</sup>.
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 === Equipment performance and process related parameters ===
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