Specific Process Knowledge/Lithography/UVExposure: Difference between revisions
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*10µm: ~280 mJ/cm<sup>2</sup> corresponding to ~40 seconds exposure at 7 mW/cm<sup>2</sup>. | *10µm: ~280 mJ/cm<sup>2</sup> corresponding to ~40 seconds exposure at 7 mW/cm<sup>2</sup>. | ||
'''AZ MiR 701''' Preliminary results | '''AZ MiR 701''' ''Preliminary results'' | ||
Compared to exposure on Aligner-6inch, the dose on KS-Aligner is five-doubled. | Compared to exposure on Aligner-6inch, the dose on KS-Aligner is five-doubled. | ||
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*2.2µm: 24 mJ/cm<sup>2</sup> corresponding to 1.7 seconds exposure at 7 mW/cm<sup>2</sup>. | *2.2µm: 24 mJ/cm<sup>2</sup> corresponding to 1.7 seconds exposure at 7 mW/cm<sup>2</sup>. | ||
'''AZ nLOF 20XX''' Preliminary results | '''AZ nLOF 20XX''' ''Preliminary results'' | ||
Compared to exposure on Aligner-6inch, the dose on KS-Aligner is the same. | Compared to exposure on Aligner-6inch, the dose on KS-Aligner is the same. | ||